Compared to Photo lithography, Electron beam lithography results in : 

Explanation:

Photo Lithography vs. Electron Beam Lithography

Definition: Lithography is a key process in the fabrication of integrated circuits and microelectromechanical systems (MEMS). The two primary lithography techniques are photo lithography and electron beam lithography. While both methods aim to transfer a pattern onto a substrate, they differ significantly in terms of their mechanisms, capabilities, and applications.

Photo Lithography:

Photo lithography, also known as optical lithography, uses light to transfer a geometric pattern from a photomask to a light-sensitive photoresist on the substrate. The process involves several steps, including coating the substrate with photoresist, exposing it to UV light through a mask, developing the photoresist, and etching the exposed areas.

Electron Beam Lithography (EBL):

Electron beam lithography, on the other hand, uses a focused beam of electrons to directly write patterns onto an electron-sensitive resist. Unlike photo lithography, which uses a mask, EBL is a maskless technique, making it highly versatile for research and development applications.

Advantages of Electron Beam Lithography:

• Higher Resolution: EBL can achieve much higher resolution compared to photo lithography. This is because the wavelength of electrons is much shorter than that of UV light, allowing for finer patterning. EBL can produce features as small as a few nanometers, which is essential for advanced semiconductor devices and nanotechnology applications.
• Maskless Process: EBL does not require a photomask, making it ideal for prototyping and small-scale production. This reduces the time and cost associated with mask fabrication.
• Flexibility: EBL allows for the creation of complex and arbitrary patterns that might be challenging to achieve with photo lithography. This flexibility is particularly valuable in research settings where custom designs are frequently needed.

Disadvantages of Electron Beam Lithography:

• Lower Throughput: One significant drawback of EBL is its lower throughput. Writing patterns with an electron beam is a serial process, meaning it is much slower than the parallel process of photo lithography. This makes EBL less suitable for high-volume manufacturing.
• Cost: The equipment and operating costs for EBL are generally higher than for photo lithography. The need for a vacuum environment and precise control of the electron beam adds to the complexity and cost.

Applications:

Due to its high resolution and flexibility, EBL is widely used in the research and development of advanced semiconductor devices, nanostructures, and MEMS. It is also employed in the fabrication of photonic devices, quantum dots, and other nanoscale structures.

Correct Option Analysis:

The correct option is:

Option 1: Higher resolution.

This option correctly identifies one of the primary advantages of electron beam lithography over photo lithography. The shorter wavelength of electrons allows EBL to achieve much finer resolution, making it possible to produce extremely small and precise features.

Additional Information

To further understand the analysis, let’s evaluate the other options:

Option 2: Lower resolution.

This option is incorrect. As explained, electron beam lithography offers higher resolution than photo lithography due to the shorter wavelength of electrons compared to UV light. This enables EBL to produce much finer features.

Option 3: Same resolution.

This option is also incorrect. The resolution of electron beam lithography is significantly higher than that of photo lithography. The two techniques do not produce the same level of detail and precision.

Option 4: None of the above.

This option is not applicable, as option 1 correctly identifies the advantage of higher resolution in electron beam lithography.

Conclusion:

Understanding the differences between photo lithography and electron beam lithography is crucial for selecting the appropriate technique for specific applications. Electron beam lithography, with its higher resolution and flexibility, is particularly valuable for advanced research and development. Despite its lower throughput and higher costs, EBL remains a powerful tool for fabricating nanoscale structures and devices that require precision and fine detail.